Chemical Vapor Deposition (CVD) Market Analysis 2017-2025 - Focus on Microelectronics, Data Storage, Solar Products, Cutting Tools & Medical Equipment - Research and Markets

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The "Chemical Vapor Deposition (CVD) Market Analysis by Category, by Applications (Microelectronics, Data Storage, Solar Products, Cutting Tools, Medical Equipment), by Region and Segment Forecasts, 2014 - 2025" report has been added to Research and Markets' offering.

The global chemical vapor deposition (CVD) market is expected to reach USD 48.01 billion by 2025

Globally increasing demand from semiconductor industry has been a major factor driving industry growth. Also, growing consciousness regarding the benefits of these products along with consumer preference for modern and durable electronic devices has resulted in increased utilization CVD coatings in various applications.

CVD technology is employed for producing high-performance solid materials mainly to manufacture thin films for the semiconductor industry. In this process, the wafer/substrate comes in contact with a volatile precursor that reacts to form different types of deposits such as pyrolytic coatings, also referred to as hard coatings.

CVD coatings are generally deposited at higher temperatures and exhibit strong adhesion to glass surfaces. The volatile precursors for the process include halides (TiCl4, TaCl5, WF6), hydrides (SiH4, GeH4, and ammonia), metal organic compounds (metal alkyls/alkoxides/ dialylamides/diketonates/carbonyls), and others (ligands and complexes).

In the current scenario, industry players are focusing on developing processes for hybrid thin inorganic-organic deposition films to lower the production costs, thereby driving the semiconductor industry. This trend has led to increased and tighter supply of titanium compounds in compliance with environmental norms.

CVD equipment was the largest category in 2016 and is expected to maintain a relatively average growth rate over the forecast period owing to good quality of deposition films obtained from the equipment. CVD services segment is the fastest growing chemical vapor deposition segment owing to technological advancements in technologies such as plasma enhanced process, hot-wire and combustion based.

Key players including Veeco Instruments, Inc., Ulvac, Inc., IHI Corporation, Applied Materials Inc. Tokyo Electron Limited and Adeka Corporation dominates the global market in 2016 with major market share.

Key Topics Covered:

Chapter 1. Methodology and Scope

Chapter 2. Executive Summary

Chapter 3. Chemical Vapor Deposition (CVD) Industry Outlook

Chapter 4. Chemical Vapor Deposition (CVD): Category Outlook

Chapter 5. Chemical Vapor Deposition (CVD): Application Outlook

Chapter 6. Chemical Vapor Deposition (CVD): Regional Outlook

Chapter 7. Competitive Landscape

Chapter 8. Company Profiles

  • Adeka Corporation
  • Aixtron SE
  • Applied Materials Inc.
  • ASM International NV
  • IHI Corporation
  • Lam research Corporation
  • Plasma-Therm
  • Denton Vacuum LLC
  • Richter Precision Inc.
  • Tokyo Electron Limited
  • Veeco Instruments Inc.
  • Ulvac Inc.
  • Intevac, Inc.
  • CVD Equipment Corporation

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Business Wire: 18:03 GMT Thursday 12th October 2017

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